Pulsed Laser Deposition
- facility to deposit high-quality thin films and heterostructures. The PLD is equipped by a RHEED to control the films´ growth.
- UV lithography – Reactive Ion etching – Wet etching – Focused Ion Beam.
- DC & RF Sputtering deposition system.
Denton Desk V SPUTTER SYSTEM for electrical contacts
- Magnetic fields ranging from 0T and 1.5T
- 10K < T < 300K helium close cycle cryostat
MICROMAGNETIC SIMULATIONS with μmax, OOMMF
This project has received funding from the European Union's Horizon 2020 research and innovation programme under the Marie Sktodowska-Curie grant agreement Nº 734187.